- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/025 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
Patent holdings for IPC class G03F 7/025
Total number of patents in this class: 60
10-year publication summary
0
|
4
|
4
|
5
|
10
|
5
|
3
|
4
|
3
|
1
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Datalase Ltd. | 115 |
12 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
4 |
Lawrence Livermore National Security, LLC | 1834 |
4 |
JSR Corporation | 2476 |
3 |
Ecole Polytechnique Federale de Lausanne (epfl) Epfl-tto | 14 |
3 |
HRL Laboratories, LLC | 1588 |
3 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
2 |
FUJIFILM Electronic Materials U.S.A., Inc. | 270 |
2 |
Rohm and Haas Electronic Materials LLC | 637 |
2 |
3m Innovative Properties Company | 18406 |
1 |
Sony Corporation | 32931 |
1 |
International Business Machines Corporation | 60644 |
1 |
Tokyo Electron Limited | 11599 |
1 |
Samsung SDI Co., Ltd. | 6671 |
1 |
Massachusetts Institute of Technology | 9795 |
1 |
Toray Industries, Inc. | 6652 |
1 |
3D Glass Solutions, Inc. | 75 |
1 |
Changzhou Tronly Advanced Electronic Materials Co., Ltd. | 67 |
1 |
Changzhou Tronly New Electronic Materials Co.,Ltd. | 66 |
1 |
Covestro Deutschland AG | 2429 |
1 |
Other owners | 14 |